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Anti Glare Film

MEMSLUX utilizes its proprietary semiconductor-based MEMS processing technology to develop ultra-precise molding techniques for creating three-dimensional microstructures. This technology has been applied to high-performance anti-glare (AG) films that offer excellent visibility and minimal sparkling effects. 

[ Example of MEMSLUX’s AG Film Application ]

 AG 필름 특징

While traditional anti-glare films reduce glare through diffuse reflection from surface roughness, they are often unsuitable for high-resolution displays due to the sparkling phenomenon. MEMSLUX designs and optimizes three-dimensional micro-optical patterns using advanced optical simulation programs, which scatter reflected light from external sources while maintaining light transmission through the display. 

[ Schematic and Mechanism of AG Film Incorporating 3D Micro-Optical Patterns Derived from Optical Simulations ]

Our patented 3D diffuser lithography technology ensures uniform performance over large areas, enhancing display visibility, reducing eye strain, and providing a more comfortable viewing experience. Additionally, MEMSLUX offers customized AG film solutions tailored to various applications through collaboration with clients. 

Anti Glare Film

MEMSLUX utilizes its proprietary semiconductor-based MEMS processing technology 

to develop ultra-precise molding techniques for creating three-dimensional microstructures. 

This technology has been applied to high-performance anti-glare (AG) films that offer excellent visibility and minimal sparkling effects. 

[ Example of MEMSLUX’s AG Film Application ]
AG Film
Features

While traditional anti-glare films reduce glare through diffuse reflection from surface roughness, they are often unsuitable for high-resolution displays due to the sparkling phenomenon. MEMSLUX designs and optimizes three-dimensional micro-optical patterns using advanced optical simulation programs, which scatter reflected light from external sources while maintaining light transmission through the display. 

[ Schematic and Mechanism of AG Film Incorporating 3D Micro-Optical Patterns Derived 
from Optical Simulations ]

Our patented 3D diffuser lithography technology ensures uniform performance over large areas, enhancing display visibility, reducing eye strain, and providing a more comfortable viewing experience. 

Additionally, MEMSLUX offers customized AG film solutions tailored to various applications through collaboration with clients. 

503, 272-16 Munji-ro, Yuseong-gu, 
Daejeon 34050, Republic of Korea
Tel. +82-42-867-0504   Fax. +82-505-850-0504
E-mail. info@memslux.com

US office

139 CENTRE ST STE 304, New York, NY 10013, USA

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